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  • ...common to select photoresists for electron-beam exposure. [[Electron beam lithography]] usually relies on resists dedicated specifically to electron-beam exposur ...ature and pressure environments) is needed for a device.<ref name="imprint lithography">{{cite journal|doi=10.1039/b918834g|title=Rapid, cost-efficient fabricatio
    16 KB (2,176 words) - 10:09, 20 September 2010
  • With the development of microfabrication and nanotechnology, the study of microfluidics and nanofluidics are drawing ...romachining with sacrificial layers, nano-imprinting lithography, and soft-lithography.
    23 KB (3,367 words) - 10:12, 20 September 2010